Challenges in realizing ultraflat materials surfaces

• Takashi Yatsui,
• Wataru Nomura,
• Fabrice Stehlin,
• Olivier Soppera,
• Makoto Naruse and
• Motoichi Ohtsu

Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99

• progress toward the realization of ultraflat materials surfaces. First, we review the development of surface-flattening techniques. Second, we briefly review the dressed photon–phonon (DPP), a nanometric quasiparticle that describes the coupled state of a photon, an electron, and a multimode-coherent

• model that describes the scale-dependent effects of optical near-fields. Finally, we present the future outlook for these technologies. Keywords: dressed photon–phonon; phonon-assisted process; polishing; self-organized process; Review Introduction In order to improve device performance and to

• nanophotonics in the next section. Optical near field: dressed photon–phonon Near-field optics has made it possible to reduce the size of photonic devices to the sub-wavelength scale or smaller [17]. In particular, nanoscale photonic devices such as AND-gates, NOT-gates, and focusing devices have been developed